Tuesday, September 25, 2018

Sino-emic Chooses Oxford Instruments Plasma Technology Etch Systems for Manufacturing Facility

Optoelectronics supplier Oxford Instruments Plasma Technology (OIPT) has announced that Sino-emic has selected OIPT's Cobra plasma etch systems for their manufacturing facilities in Taizhou City, China.Sino-semic, the first all-Chinese developer and manufacturer of vertical-cavity surface-emitting lasers (VCSELs) for face recognition, noted that process capability and local support were key factors in their decision to adopt the high-performance inductively coupled plasma (ICP) etch Cobra systems.

"We chose Oxford Instruments to supply our ICP etch equipment because they offer cutting edge plasma processing systems and unrivalled process support, which will be invaluable to us during our production scheme," said Li Jun, vice general manager at Sino-semic. 

The Cobra process solutions are designed to support device applications such as lasers, radio frequency, power, and advanced LEDs."VCSEL based devices are entering another exciting phase of growth," said Richard Pollard, managing director at OIPT. "We are thrilled to be providing our VCSEL processing solutions to a pioneering production manufacturer such as Sino-semic."Oxford Instruments Plasma Technology offers flexible, configurable process tools and processes for the precise, controllable, and repeatable engineering of micro- and nano-structures.

Source: LINK

The PlasmaPro 100 range of etch and deposition tools can be fitted with a variety of substrate electrodes, enabling processes over a wide temperature range. They offer a 200mm platform with single wafer and multi-wafer batch capability. The process modules offer excellent uniformity, high throughput and high precision processes.[source Oxford Instruments LINK]

No comments:

Post a Comment