Thursday, May 4, 2017

Advanced Energy sales for Plasma ALD sources show growth in Logic and 3DNAND

Advanced energy recently reported their 1Q/2017 showing off a Q1 Revenue increased 44.9% y/y and 10.3% q/q to $149.4 million (LINK)

In the following eraingscall (Yahoo Finance) Yuval Wasserman, Advanced Energy Industries, Inc. - CEO, President and Director, had this to say about their recent design wins for Plasma ALD remote plasma sources and emerging plasma sources for etch accelerated by 3DNAND and Logic 10 nm ramp demand.
A key driver of our success comes from continuously investing in R&D and winning new designs in this fast-growing areas. This quarter, we saw a broad set of design wins in semiconductor applications for customers in Asia and the U.S. Advanced 3D memory and logic devices drove the majority of the wins. We also won designs in new plasma-enhanced atomic layer deposition applications with our new remote plasma source technology, which is being adopted for radicals-based processes.
Finally, this quarter we had an important milestone with our solid state RF matching product, which has progressed from evaluation to pilot and mass production for advanced etch applications. Solid state RF matches enable the performance of emerging short plasma processes with high speed, reliable and dynamic control.

Looking ahead, solid state drives and mobile headsets continue to generate demand, leading to 3D NAND acceleration and additional foundry and logic investment in the ramp of 10 nanometers and the development of 7 and 5 nanometers. As the semiconductor capital equipment industry strives to keep pace, some OEMs are reaching maximum for capacity and tailoring their material planning accordingly. This leads us to expect our second quarter semiconductor revenues to remain at or above the first quarter's level.
Advanced Energy are offer in a ICP source (Litmas RPS) as well as a CCP (QUANTA) sources that are used in ALD and ALE, besides other classical semicondcutor processing like PECVD, PVD and RIE.

The Advanced Energy Litmas RPS Source (ICP type) uses in thin film deposition (LINK)


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