Epitaxial deposition and process equipment maker Veeco Instruments Inc
of Plainview, NY, USA says that Osram Opto Semiconductors GmbH of
Regensburg, Germany has ordered a multi-reactor Propel High-Volume
Manufacturing (HVM) gallium nitride (GaN) metal-organic chemical vapor
deposition (MOCVD) system, as well as K475i MOCVD systems.
The K475i system incorporates Veeco’s Uniform FlowFlange technology,
producing films with very high uniformity and improved within-wafer and
wafer-to-wafer repeatability with what is claimed to be the industry’s
lowest particle generation for demanding applications like photonics
and advanced LEDs.
Source: Semiconductor Today LINK
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