Thursday, March 26, 2020

NCD supplied two Lucida M300 ALD systems for R&D to KANC

NCD has recently supplied 2 Lucida M300PL ALD systems to KANC. Lucida M300PL-O is the equipment for oxide deposition with Ozone and Plasma process, and Lucida M300PL-M is that for metal deposition with Plasma process.

These wafer process equipment have the specification below

1) System: Lucida M300PL-O, Lucida M300PL-M

2) Substrate: Wafer 300mm

3) Deposition Materials:

- Lucida M300PL-O: Al2O3, TiO2, ZrO2, ZnO, HfO2, Ta2O5

- Lucida M300PL-M: Co. Ru, W, Ir, TiN, TaN

KANC, which is the most prestigious institute of Korea on nanotechnology, is using Lucida M300PL to investigate cutting edge semiconductor development and promising applications in MEMS and IoT. So it will be expected that these systems will contribute very much to the development of high-end nanotechnology.

NCD will do best to be the best ALD equipment company with continuous R&D efforts. 
< Lucida M300PL ALD >

Friday, January 24, 2020

2020-04 ALD Financial News Brief

TSMC Expects 10% Revenue Share & HPC Products From 5nm In 2020 - Confirms Customer Shift To 2nd Gen 5nm In 2021

Wccftech reports that TSMC latest manufacturing node marketed as '7nm' has enabled Santa Clara-based application processor and graphics processing unit designer Advanced Micro Devices Inc. to compete effectively with Intel Corporation in the microprocessor arena. The post TSMC Expects 10% Revenue Share & HPC Products From 5nm In 2020 - Confirms Customer Shift To 2nd Gen 5nm In 2021 by Ramish Zafar appeared first on Wccftech.


Scaled perovskite solar modules pass three critical stability tests

Eindhoven (Netherlands), Genk (Belgium) January 23, 2020 – Solliance partners TNO, imec and the Eindhoven University of Technology, demonstrated encapsulated perovskite solar modules fabricated using industrial processes that withstand three established lifetime tests, i.e. the light soak test, the damp-heat test and the thermal cycling test. It is for the first time this milestone is passed with scaled perovskite solar modules prepared by research organizations.

Program release - EFDS ALD for Industry 2020 in Freiburg, Germany (March 31-April 1)

A topical workshop with a focus on industrialization and commercialization of ALD for current and emerging markets

Atomic Layer Deposition (ALD) is used to deposit ultraconformal thin films with sub-nm film thickness control. The method is unique in the sense that it employs sequential self-limiting surface reactions for growth in the monolayer thickness regime. Today, ALD is a critical technology in leading-edge semiconductor technology, and the field of application in other industries is increasing rapidly. According to the market estimates, the equipment market alone is currently at an annual revenue of US$ 1.8-1.9 billion (2018), and it is expected to double in the next 4-5 years. In a European context, ALD was invented independently twice in Europe (Russia & Finland), and since the last 15 years, Germany has grown to become one of the strongest European markets for ALD in R&D, chemicals, equipment, and end-users.

Thursday, January 16, 2020

2020-03 ALD Financial News Brief

ASM International announces Q4 2019 orders substantially above guidance

Reflecting stronger than expected market conditions, order intake in Q4 2019 came in slightly above €370 million, substantially above the range of €290-310 million that ASMI guided for with the publication of the Q3 2019 results on October 30, 2019. Based on preliminary numbers, sales in Q4 2019 slightly exceeded the high end of the guidance of €310-330 million.

Both Q4 orders and preliminary sales mentioned above, as well as previous Q4 guidance,, do not include the earlier announced proceeds of US$61 million (approximately €56 million) related to the settlement of the arbitration proceeding with Kokusai Electric Corporation.

ASMI will report fourth quarter and full-year 2019 financial results on February 25, 2020.

Picosun's ALD Technology Enables 3D Silicon-Integrated Microcapacitors With Unprecedented Performance

Picosun Group, a global provider of leading AGILE ALD® (Atomic Layer Deposition) thin-film coating solutions, reports record performance of silicon-integrated, three-dimensional deep trench micro capacitors manufactured using its ALD technology. Increasing efficiency and performance demands of portable and wearable electronics, along with their shrinking size in accordance with the Moore's law, set new challenges to the power management of these devices as well. A solution is the further integration of the devices' key components into so-called SiP (systems-in-package) or SoC (systems-on-chip) architectures, where everything, including the energy storage such as batteries or capacitors, is packed close to each other into one compact, microscale-miniaturized assembly. The post Picosun's ALD Technology Enables 3D Silicon-Integrated Microcapacitors With Unprecedented Performance appeared first on Semiconductor Digest. 

Metal mask coating by ALD for reliable plasma process in PECVD

NCD has steadily developed large area and high throughput ALD equipment and technology. The applications for display, solar cell, and semiconductor fields have been already commercialized, and also NCD has worked hard to find use in special markets like excellent plasma protective coating on metal masks. NCD will aggressively respond to the development and then supply of ALD equipment, which customers would need for various industries in the future.

TSMC is being pressured to make chips in the US because of security concerns

The United States has increased its pressure on the Taiwan Semiconductor Manufacturing Company, aka TSMC, for producing its military-use chips in the country. This is being done to ensure that the world's biggest contract chipmaker can manufacture the high-security components free from potential Chinese interference. 
The post TSMC is being pressured to make chips in the US because of security concerns appeared first on Gizmochina. 

Friday, January 10, 2020

Advanced Energy Announces Grand Opening of State-of-the-Art Advanced Materials Processing Showcase Lab Near Frankfurt

Global leader in power solutions for advanced thin film development to unveil new German hub for critical plasma deposition applications and materials characterization to serve clients from around the world

FORT COLLINS, Colo.--(BUSINESS WIRE)--Dec. 10, 2019-- Advanced Energy Industries, Inc. (Nasdaq: AEIS) – a global leader in highly engineered, precision power conversion, measurement and control solutions – is pleased to announce the grand opening of its Advanced Materials Processing (AMP) Showcase Lab near Frankfurt, Germany. Located in Karlstein am Main, the state-of-the-art facility includes office space and lab space for plasma deposition and materials characterization. The lab will serve as a central hub for AE product demonstrations and customers’ plasma deposition research and development activities, providing a superior experience for thin film developers.

This press release features multimedia. View the full release here:

AE’s plasma lab multi-chamber inline coater showing substrate carrier and vacuum load lock in the foreground and with various gas handling cabinets and AE’s power supplies in racks in the background. This equipment includes but is not limited to planar and rotatable dual magnetron sputtering (DMS), and has plasma etch pre-cleaning capability. Various substrate sizes from small experimental coupons (e.g. glass, sapphire, silicon and more) up to 500x600 mm2 rectangular sheets (e.g. glass, plexiglass, plastic, metal and more) can be utilized. (Photo: Business Wire)

Saturday, January 4, 2020

AMD is gaining on Intel rapidly

WCCFTech reports (LINK) that in a survey report of machines running PassMark (Australian CPU benchmarking company), the company reported AMD's market share increasing to 40% for the first time in a very long time. Lats time Intel and AMD were close were in 2005 when AMD was still operating its Fab in Dresden, Germany.

AMD has since then moved to fabricate its processors first at Globalfoundires and then moved over to TSMC. The current Zen 2 based processors are made using TSMC 7 nm while Intel runs its own 14 and 10 nm technology. Intel 10 nm and TSMC 7 nm are roughly comparable when it comes to scaling dimensions.

This graph counts the baselines submitted to PassMark during the period and therefore is representative of CPUs in use rather than CPUs purchased (PassMark).

TSMC to soon start production of 5nm node based Apple A14 SoC

TSMC will be the sole foundry making 5 nm process technology based Apple A14 chipsets for the 2020 iPhone models and the production will start in the second quarter of this year in preparation for the traditional end of Q3 launch. The A14 will be made using TSMC’s new 5 nm process and Apple’s order will take up two thirds of the foundry’s capacity. There’s a chance the iPhone 12 phones will be the first to hit the market with a 5nm chipset.

Source: GSM Arena (LINK)
By Abhishekkumar Thakur