Sunday, September 22, 2019

Intel is stepping up preparations for 7nm manufacturing with EUV Lithography

According to DigiTimes [LINK] Intel is stepping up preparations for 7nm manufacturing and has started placing equipment and materials orders for its 7nm EUV fabrication processes since August to attain the launch of its 7nm products by 2021 as it announced in May 2019.
Dr. Murthy Renduchintala, Intel’s chief engineering officer and group president of the Technology, Systems Architecture and Client Group, spoke at the 2019 Intel Investor Meeting in Santa Clara, California, on Wednesday, May 8, 2019. Slides from his presentation included information on process technology and packaging, 10nm "Ice Lake" processors, and Intel's innovation. (Credit: Intel Corporation)

7nm Status as of Intel Investment Forum May 2019 (LINK): Renduchintala provided first updates on Intel’s 7nm process technology that will deliver 2 times scaling and is expected to provide approximately 20 percent increase in performance per watt with a 4 times reduction in design rule complexity. It will mark the company’s first commercial use of extreme ultraviolet (EUV) lithography, a technology that will help drive scaling for multiple node generations.

The lead 7nm product is expected to be an Intel Xe architecture-based, general-purpose GPU for data center AI and high-performance computing. It will embody a heterogeneous approach to product construction using advanced packaging technology. On the heels of Intel’s first discrete GPU coming in 2020, the 7nm general purpose GPU is expected to launch in 2021. 
By Abhishekkumar Thakur, Jonas Sundqvist

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