Earlier this year Veeco launched their new platform for Batch ALD for high volume production and now you can find more details on the Veeco product offering pages: LINK
Firebird - Batch ALD for High Volume Production
The Firebird™ system is a fully automated batch production ALD platform delivering superb uniformity with best-in-class throughput at the lowest possible cost-per-wafer. Integrating proven Veeco automation solutions, it enables safe wafer handling via low-impact batch transfer. Its modular pre-heat & cool-down design enables a flexible thermal management solution tailored around your specifications. The Firebird™ system’s high capacity reactor(s), low consumables/maintenance costs and compact footprint deliver the most cost-effective solution while exceeding your throughput requirements.
Firebird™ - ALD System for Specialized Wafer Production
Key features include:
- Ideal for oxide films, including encapsulation & barrier layers, optical coating
- Best-in-class throughput (up to 40,000 wafers per month)
- Proven Veeco automation
- Safe wafer handling for fragile / temperature sensitive substrates (e.g., LNO / LTO / glass)
- Modular thermal management for optimal process flexibility and throughput
- Worldwide sales, service and support
Configurability advantageThe modular system configuration can be effectively tailored to minimize process flow bottlenecks and offers outstanding processing flexibility.
2 reactors, 1 heat-up module
1 reactor, 2 heat-up modules
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