Monday, July 30, 2018

Gelest Announced Diiodosilane Commercialization for PEALD Silicon Nitride

MORRISVILLE, Pa., July 27, 2018 — Semiconductor material Gelest Inc. has announced the commercializing of diiodosilane to meet the global demand of the semiconductor industry for next-generation semiconductor chips.

Diidosilane (LINK)

Gelest’s dedicated diiodosilane plant in Morrisville is fully operational and can produce commercial quantities of diiodosilane with purity in excess of 99.9 percent. Diiodosilane is a key chemical precursor used by semiconductor companies worldwide in the development and scale-up of next-generation semiconductor chips that require high-throughput, highly conformal silicon nitride thin films.

Diiodosilane is typically deposited by plasma-enhanced atomic layer deposition to create the silicon nitride thin film. Gelest sees a significant increase in demand for high purity diiodosilane driven by development and production of semiconductor chips requiring silicon nitride thin films at low thermal budgets.

Gelest is a manufacturer of specialty materials for the semiconductor industry.

Source : Photonics LINK

Gelest is sponsoring and exhibiting at the AVS ALD2018 conference currently taking place in South Korea (LINK)  

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