Oxford Instruments are promoting a cluster tool for Atomic Scale Processing

Oxford Instruments are promoting a cluster tool for Atomic Scale Processing including the metrology tools to analyze and monitor these processes:

• Atomic Layer Deposition (ALDep)
• Atomic Layer Etch (ALEt)
• 2D growth by high temperature Chemical Vapour Deposition (CVD)

Metrology:

• Atomic Force Microscopy (AFM) 
• Raman Spectroscopy.

The technology exists to make these layers and Plasma Technology has these tools and is uniquely able to cluster them all on a single tool (LINK).